INTERNATIONAL JOURNAL FOR ENGINEERING AND TECHNOLOGY
(ISSN: 2180-3633 - Online)
 

 		  
        Editor-in-Chief

Assoc. Prof. Dr. Lee Sun Chai
Faculty of Engineering and IT
INTI International University
Persiaran Perdana BBN
71800 Nilai
Negeri Sembilan
MALAYSIA

sunchai.lee@newinti.edu.my

 
 
 		  

2010 Vol. 1, Issue No. 1 - 3

 

Generation of Soft X-Ray (SXR) from Plasma Focus


Federico A Roy Jr
Faculty of Engineering and Technology, INTI International University, Malaysia

Chong Perk Lin
Faculty of Engineering and Technology, INTI International University, Malaysia

Sor Heoh Saw
Centre for Plasma Research, INTI International University, Malaysia

Lee Sing
Institute of Plasma Focus Studies, 32 Oakpark Drive, Chadstone,VIC 3148, Australia

 

The use of soft-x-rays (SXR) for applications such as nano-lithography, microelectronic device fabrication, and spectroscopy has been demonstrated to be feasible. Among the leading problems still being actively researched is the optimization of the SXR source. This paper looks at some of the results of research into SXR yield from several plasma focus machines.


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