INTERNATIONAL JOURNAL FOR ENGINEERING AND TECHNOLOGY
(ISSN: 2180-3633 - Online)

Assoc. Prof. Dr. Lee Sun Chai
Faculty of Engineering and IT
INTI International University
Persiaran Perdana BBN
71800 Nilai
Negeri Sembilan
MALAYSIA

sunchai.lee@newinti.edu.my

2010 Vol. 1, Issue No. 1 - 4

Comparison of Device Parameters and Plasma Characteristics of Plasma Focus Devices

Vengadeshwaran V
Faculty of Engineering and Technology, INTI International University, Malaysia

Saw S. H.
Centre for Plasma Research, INTI International University, Malaysia

S. Lee
Institute of Plasma Focus Studies, 32 Oakpark Drive, Chadstone,VIC 3148, Australia

The design and development of various plasma focus devices enhance its utilization in a wide range of applications. Plasma focus devices act as a source of soft and hard X-rays, neutrons, electron & ion beams. The soft X-rays are used in nano-technology, micro-lithography, micro-machining and for the visualizing of transient dynamics. The hard X-rays are used in understanding the dynamics of moving or rotating objects and for investigating non stationary behaviors of gases, fluids etc. The neutron pulses have potential of being widely used in material testing, explosive ignition and illicit material detection in cargo and luggage handling. The neutron beams are also used in isotope production and cancer therapy. In this paper the device parameters and plasma characteristics of various plasma focus devices are presented.

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